Articles written in Sadhana
Volume 34 Issue 4 August 2009 pp 557-562
In this paper, we explore RF magnetron sputtered Phosphor–silicate–glass (PSG) ﬁlm as a sacriﬁcial layer in surface micromachining technology. For this purpose, a 76 mm diameter target of phosphorus-doped silicon dioxide was prepared by conventional solid-state reaction route using P2𝑂5 and SiO2 powders. The PSG ﬁlms were prepared in a RF (13·56 MHz) magnetron sputtering system at 300 watt RF power, 20 mTorr pressure and 45 mm target-to-substrate spacing without external substrate heating. Microstructures of sputtered silicon dioxide ﬁlm were fabricated using sputtered PSG ﬁlm as sacriﬁcial layer in surface micromachining process.