The effect of hydrogen absorption on electrical resistance with temperature for TiNi and TiNi–Cr thin films was investigated. The TiNi thin films of thickness 800 Å were deposited at different angles ($\theta = 0^{\circ}, 30^{\circ}, 45^{\circ}, 60^{\circ}$ and $75^{\circ}) under 10$^{−5}$ Torr pressure by thermal evaporation on the glass substrate at room temperature. A layer of Cr of thickness 100 Å was coated on the TiNi thin films. The changing rate of hydrogen absorption increases after Cr layer coating because Cr enhances the catalytic properties of hydrogen absorption in thin films. The rate of hydrogen absorption increases with temperature at lower range but at higher range of temperature it was found to decrease and also it was found that the hydrogen absorption increases with angle of deposition.