A modified mode of plasma production in a double plasma device is presented and plasma parameters are controlled in this configuration. Here plasma is produced by applying a discharge voltage between the hot filaments in the source (cathode) and the target magnetic cage (anode) of the device. In this configuration, the hot electron emitting filaments are present only in the source and the magnetic cage of this is kept at a negative bias such that due to the repulsion of the cage bias, the primary electrons can go to the grounded target and produce plasma there. The plasma parameters can be controlled by varying the voltages applied to the source magnetic cage and the separation grid of the device.