Polarization property is important to the optical imaging system. It has recently been understood that the polarization properties of light can be fruitfully used for improving the characteristics of imaging system that includes polarizing devices. The vector wave imagery lends an additional degree of freedom that can be utilized for obtaining results that are unobtainable in scalar wave imagery. This calls for a systematic study of diffraction properties of different apertures using polarization-sensitive devices. In the present paper, we have studied the Fraunhofer diffraction pattern of slits masked by different kinds of polarizing devices which introduce a phase difference between the two orthogonal components of the incident beam.