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Vinod Kapoor
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Volume 28 Issue 2 April 2005 pp 97-102 Semiconductors
Manju Malhotra Madhukar Gautam J K Radhakrishnan Vinod Kapoor Sudeep Verma Upendra Kumar Anand Kumar Garima Gupta Anshu Goyal S Sitharaman
Growth of Hg1–𝑥Cd𝑥Te epitaxial films by a new technique called asymmetric vapour phase epitaxy (ASVPE) has been carried out on CdTe and CZT substrates. The critical problems faced in normal vapour phase epitaxy technique like poor surface morphology, composition gradient and dislocation multiplication have been successfully solved. The epitaxial films have been electrically characterized by using the Hall effect and capacitance–voltage (𝐶–𝑉) measurements.
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Bulletin of Materials Science
Volume 46, 2023
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Continuous Article Publishing mode
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Bulletin of Materials Science | News
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Dr Shanti Swarup Bhatnagar for Science and Technology
Posted on October 12, 2020Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
Chemical Sciences 2020Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
Physical Sciences 2020 -
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Posted on July 25, 2019Click here for Editorial Note on CAP Mode
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