V R Katti
Articles written in Bulletin of Materials Science
Volume 8 Issue 3 June 1986 pp 325-331
The development of Cs3Sb transmissive interference cathode technology needs processing of such photocathodes on thin dielectric films coated on glass substrates. Here the use of such films as light resonators is made for reducing the light losses due to reflection at the cathode surface. Consequently the sensitivity of the photocathode is enhanced. TiO2 and SiO films are chosen for their good optical properties with Cs3Sb photocathodes in interference photoemission. Deposition methods and instrumentation in assessing their properties are discussed.
Volume 8 Issue 3 June 1986 pp 333-338
Fabrication of thin film patterns involves a sequence of photolithographic and chemical processes to define the high resolution features in thin films on the surface of the optical substrates. The substrates used in the present work were curved fused silica with radii of curvature 58 mm and 18 mm which are used as photocathode substrates for image converter and image intensifier tube devices. The resolution pattern and bar chart were successfully printed on these substrates using a secondary conformable photomask of Mylar.
Volume 14 Issue 2 April 1991 pp 423-427 International Conference On Superconductivity—I
The deposition of yttria-stabilized zirconia (YSZ) as buffer layer on (100) silicon has been studied by rf sputtering with a view to subsequently preparing superconducting films of YBa2Cu3O
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