• T Bhuvana

      Articles written in Bulletin of Materials Science

    • Polystyrene as a zwitter resist in electron beam lithography based electroless patterning of gold

      T Bhuvana G U Kulkarni

      More Details Abstract Fulltext PDF

      The resist action of polystyrene (𝑀w, 2,600,000) towards electroless deposition of gold on Si(100) surface following cross-linking by exposing to a 10 kV electron beam, has been investigated employing a scanning electron microscope equipped with electron beam lithography tool. With a low dose of electrons (21 𝜇C/cm2), the exposed regions inhibited the metal deposition from the plating solution due to cross-linking—typical of the negative resist behaviour of polystyrene, with metal depositing only on the developed Si surface. Upon increased electron dosage (160 𝜇C/cm2), however, Au deposition took place even in the exposed regions of the resist, thus turning it into a positive resist. Raman measurement revealed amorphous carbon present in the exposed region that promotes metal deposition. Further increase in dosage led successively to negative (220 𝜇C/cm2) and positive (13,500 𝜇C/cm2) resist states. The zwitter action of polystyrene resist has been exploited to create line gratings with pitch as low as 200 nm and gap electrodes down to 80 nm.

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