• S Verma

      Articles written in Bulletin of Materials Science

    • Progress in deep-UV photoresists

      P B Sahoo R Vyas M Wadhwa S Verma

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      Higher resolution can be achieved in lithography by decreasing the wavelength of the exposure source. However, resist material and their processing are also important when we move to a shorter wavelength lithography technology. This paper reviews the recent development and challenges of deep-UV photoresists and their processing technology.

    • Etching of GaAs substrates to create As-rich surface

      A Chanda S Verma C Jacob

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      Several different cleaning procedures for GaAs (100) substrates are compared using X-ray photoelectron spectroscopy and optical microscopy. This work emphasizes the effect of the last etching step: using either HCl, HF–ethanol (5%) or static deionized water after HCl cleaning. All the procedures except HCl solution (1 : 1) produce an As-rich surface. Also, none of the etchants except HF–ethanol solution produce Ga or As-rich (oxide free) surfaces. Optical microscopic study shows different etch pits produced due to etching in different solutions.

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      Posted on July 25, 2019

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