Rabibrata Mukherjee
Articles written in Bulletin of Materials Science
Volume 31 Issue 3 June 2008 pp 249-261
Soft lithography meets self-organization: Some new developments in meso-patterning
Rabibrata Mukherjee Ashutosh Sharma Ganesh Patil Danish Faruqui Partho Sarathi Gooh Pattader
This is a brief review of our recent and ongoing work on simple, rapid, room temperature, pressure- less and large area (∼ cm2) imprinting techniques for high fidelity meso-patterning of different types of polymer films. Examples include soft solid polymer films and surfaces like cross-linked polydimethylsiloxane (PDMS) and polyacrylamide (PAA) based hydrogels, thermoplastics like polystyrene (PS), polymethylmethacrylate (PMMA) etc both on planar and curved surfaces. These techniques address two key issues in imprinting:
attainment of large area conformal contact with the stamp, especially on curved surfaces, and
ease of stamp detachment without damage to the imprinted structures.
The key element of the method is the use of thin and flexible patterned foils that readily and rapidly come into complete conformal contact with soft polymer surfaces because of adhesive interfacial interactions. The conformal contact is established at all length scales by bending of the foil at scales larger than the feature size, in conjunction with the spontaneous deformations of the film surface on the scale of the features. Complex two-dimensional patterns could also be formed even by using a simple one-dimensional master by multiple imprinting. The technique can be particularly useful for the bulk nano applications requiring routine fabrication of templates, for example, in the study of confined chemistry phenomena, nanofluidics, bio-MEMS, micro-imprinting, optical coatings and controlled dewetting.
Volume 43 All articles Published: 6 July 2020 Article ID 0168 Editorial
The fascinating world of Soft Materials
KAMLENDRA AWASTHI RABIBRATA MUKHERJEE S KRISHNA PRASAD
Volume 43 All articles Published: 8 August 2020 Article ID 0186
NANDINI BHANDARU NEHA AGRAWAL MENEKA BANIK RABIBRATA MUKHERJEE ASHUTOSH SHARMA
Cross-linked polydimethylsiloxane (PDMS) films and surfaces obtained by thermal cross-linking of commercially available Sylgard 184 are widely utilized in many areas of science, due to superior thermal stability, low dielectric constant, transparency and biocompatibility. Cross-linked PDMS surfaces are weakly hydrophobic and several experiments, particularly the ones that utilize capillary-driven microscale flow require the modulation of the surface wettability. A well-known strategy to achieve the same is by exposing the Sylgard 184 surface to UV/ozone (UVO) treatment at room temperature. Depending on the duration of exposure, the wettability drops from hydrophobic to a nearcompletewetting (water contact angle $\sim$10$^{\circ}$), due to the formation of a surface oxide layer. However, under normal atmospheric conditions, these surfaces recover their hydrophobicity over a period of time due to diffusive migration of the uncrosslinked oligomers to the surface, and formation of a hydrophobic dimethyl silicone layer. We explore the hydrophobic recovery process as a function of cross-linker concentration and UVO exposure time and show how a partially or fully recovered PDMS stamp may influence subsequent nanopatterning, including the possible creation of features with different morphology using a single stamp.
Volume 46, 2023
All articles
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Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
Chemical Sciences 2020
Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
Physical Sciences 2020
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