• RABIBRATA MUKHERJEE

      Articles written in Bulletin of Materials Science

    • Soft lithography meets self-organization: Some new developments in meso-patterning

      Rabibrata Mukherjee Ashutosh Sharma Ganesh Patil Danish Faruqui Partho Sarathi Gooh Pattader

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      This is a brief review of our recent and ongoing work on simple, rapid, room temperature, pressure- less and large area (∼ cm2) imprinting techniques for high fidelity meso-patterning of different types of polymer films. Examples include soft solid polymer films and surfaces like cross-linked polydimethylsiloxane (PDMS) and polyacrylamide (PAA) based hydrogels, thermoplastics like polystyrene (PS), polymethylmethacrylate (PMMA) etc both on planar and curved surfaces. These techniques address two key issues in imprinting:

      attainment of large area conformal contact with the stamp, especially on curved surfaces, and

      ease of stamp detachment without damage to the imprinted structures.

      The key element of the method is the use of thin and flexible patterned foils that readily and rapidly come into complete conformal contact with soft polymer surfaces because of adhesive interfacial interactions. The conformal contact is established at all length scales by bending of the foil at scales larger than the feature size, in conjunction with the spontaneous deformations of the film surface on the scale of the features. Complex two-dimensional patterns could also be formed even by using a simple one-dimensional master by multiple imprinting. The technique can be particularly useful for the bulk nano applications requiring routine fabrication of templates, for example, in the study of confined chemistry phenomena, nanofluidics, bio-MEMS, micro-imprinting, optical coatings and controlled dewetting.

    • The fascinating world of Soft Materials

      KAMLENDRA AWASTHI RABIBRATA MUKHERJEE S KRISHNA PRASAD

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    • Hydrophobic recovery of cross-linked polydimethylsiloxane films and its consequence in soft nano patterning

      NANDINI BHANDARU NEHA AGRAWAL MENEKA BANIK RABIBRATA MUKHERJEE ASHUTOSH SHARMA

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      Cross-linked polydimethylsiloxane (PDMS) films and surfaces obtained by thermal cross-linking of commercially available Sylgard 184 are widely utilized in many areas of science, due to superior thermal stability, low dielectric constant, transparency and biocompatibility. Cross-linked PDMS surfaces are weakly hydrophobic and several experiments, particularly the ones that utilize capillary-driven microscale flow require the modulation of the surface wettability. A well-known strategy to achieve the same is by exposing the Sylgard 184 surface to UV/ozone (UVO) treatment at room temperature. Depending on the duration of exposure, the wettability drops from hydrophobic to a nearcompletewetting (water contact angle $\sim$10$^{\circ}$), due to the formation of a surface oxide layer. However, under normal atmospheric conditions, these surfaces recover their hydrophobicity over a period of time due to diffusive migration of the uncrosslinked oligomers to the surface, and formation of a hydrophobic dimethyl silicone layer. We explore the hydrophobic recovery process as a function of cross-linker concentration and UVO exposure time and show how a partially or fully recovered PDMS stamp may influence subsequent nanopatterning, including the possible creation of features with different morphology using a single stamp.

  • Bulletin of Materials Science | News

    • Dr Shanti Swarup Bhatnagar for Science and Technology

      Posted on October 12, 2020

      Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
      Chemical Sciences 2020

      Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
      Physical Sciences 2020

    • Editorial Note on Continuous Article Publication

      Posted on July 25, 2019

      Click here for Editorial Note on CAP Mode

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