• R Vyas

      Articles written in Bulletin of Materials Science

    • Progress in deep-UV photoresists

      P B Sahoo R Vyas M Wadhwa S Verma

      More Details Abstract Fulltext PDF

      Higher resolution can be achieved in lithography by decreasing the wavelength of the exposure source. However, resist material and their processing are also important when we move to a shorter wavelength lithography technology. This paper reviews the recent development and challenges of deep-UV photoresists and their processing technology.

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