Nanocrystalline TiN thin films were deposited on glass substrate by d.c. magnetron sputtering. The microstructural characteristics of the thin films were characterized by XRD, FE-SEM and AFM. XRD analysis of the thin films, with increasing thickness, showed the (200) preferred orientation up to 1.26 𝜇m thickness and then it transformed into (220) and (200) peaks with further increase in thickness up to 2.83 𝜇m. The variation in preferred orientation was due to the competition between surface energy and strain energy during film growth. The deposited films were found to be very dense nanocrystalline film with less porosity as evident from their FE-SEM and AFM images. The surface roughness of the TiN films has increased slightly with the film thickness as observed from its AFM images. The mechanical properties of TiN films such as hardness and modulus of elasticity (𝐸) were investigated by nanoindentation technique. The hardness of TiN thin film was found to be thickness dependent. The highest hardness value (24 GPa) was observed for the TiN thin films with less positive micro strain.

Chromium nitride (CrN) thin films were deposited on stainless steel (grade: SA304) substrate by using d.c. reactive magnetron sputtering and the influence of process parameters such as substrate temperature, pressure, and power on their microstructural characteristics were investigated in the present work. The CrN films were characterized with X-ray diffraction (XRD) to reveal the formation of different phases and its texture. The films showed the (111) preferred orientation but its intensity decreased, while intensity of peak (200) increased with increase in working pressure. The mixture of CrN and Cr₂N phases were identified at low working pressure and temperature. The preferred orientations of CrN thin films are strongly influenced by sputtering conditions, thickness, and the induced residual stress in the films as observed in the present work. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used to characterize the morphology and surface topography of thin films, respectively. The study shows that the hardness of films strongly depends on the grain size and the film density, which are influenced by combined effect of the working pressure, temperature, and power of the sputtering process.

Oxidation and hot corrosion are serious problems in aircraft, marine, industrial, and land-base gas turbines. It is because of the usage of wide range of fuels coupled with increased operating temperatures, which leads to the degradation of turbine engines. To obviate these problems, superalloys, viz. Superni 75, Superni 718 and Superfer 800H superalloys (Midhani grade), are the prominent materials for the high temperature applications. It is very essential to investigate the degradation mechanism of superalloys due to oxidation and hot corrosion and substantiate the role of alloying elements for the formation of protective oxide films over the surface of the superalloys. Therefore, the present work investigates the oxidation and hot corrosion behaviour of superalloys exposed to air and molten salt (Na₂SO₄–60% V₂O₅) environment, respectively, at 900°C under cyclic conditions. The weight change measurements made on the superalloys during the experiments are used to determine the kinetics of oxidation and hot corrosion. X-ray diffraction (XRD), X-ray mapping and field emission scanning electron microscope (FESEM, FEI, Quanta 200F company) with EDAX Genesis software attachment, made in Czech Republic are used to characterize the corroded products of the superalloys. It is observed that the formation of scale rich in Cr₂O₃, NiO and spinel NiCr₂O₄ has contributed for the better oxidation and hot corrosion resistance of Superni 75; whereas relatively lesser hot corrosion resistance of Superfer 800H is due to the formation of non-protective oxides of iron and sulphides of iron and nickel. The parabolic rate constants calculated for the superalloys show that the corrosion rate is minimum in air as compared to molten salt environment.

The present paper deals with deposition of titanium and zirconium oxynitride films prepared from cosputtering titanium and zirconium targets by reactive RF magnetron sputtering. The effect of power variation on various properties of the deposited films is analysed. The film gets transformed from amorphous to well crystalline oxynitride films with gradual increase of target powers as observed from XRD graphs. The films exhibit hydrophilic and hydrophobic behaviours depending upon the presence of various phases. Surface energy decreases as the film properties change from hydrophilic to hydrophobic due to greater contact angle values. The optical properties were measured by UV–Vis–NIR spectrophotometer, transmission spectra and bandgap values show variation with respect to change in elemental composition as determined from EDS analysis.