P V Satyam
Articles written in Bulletin of Materials Science
Volume 29 Issue 2 April 2006 pp 101-105 Polymers
Proton beam lithography has made it possible to make various types of 3D-structures in polymers. Usually PMMA, SU-8, PS polymers have been used as resist materials for lithographic purpose. Microbeam irradiation effects on poly-tert-butyl-acrylate (PtBA) polymer using 2.0 MeV proton microbeam are reported. Preliminary results on pattern formation on PtBA are carried out as a function of fluence. After writing the pattern, a thin layer of Ge is deposited. Distribution of Ge in pristine and ion beam patterned surface of PtBA polymer is studied using the optical and secondary electron microscopic experimental methods.
Volume 34 Issue 4 July 2011 pp 595-599
Low-temperature transmission electron microscopy (TEM) studies were performed on polystyrene (PS, 𝑀w = 234 K) – Au nanoparticle composite thin films that were annealed up to 350°C under reduced pressure conditions. The composite thin films were prepared by wet chemical approach and the samples were then subsequently spin-coated on a carbon-coated copper grid for TEM measurements. TEM measurements were performed at liquid nitrogen temperatures to reduce the electron–beam-induced radiation damage. The results showed a marginal increase in Au nanoparticle diameter (2.3 nm–3.6 nm) and more importantly, an improved thermal stability of the polystyrene (PS) composite film much above its glass transition temperature
Volume 42 | Issue 6
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