P R Deshmukh
Articles written in Bulletin of Materials Science
Volume 34 Issue 6 October 2011 pp 1179-1183
In the present investigation, we report chemical synthesis of hydrous tin oxide (SnO2:H2O) thin films by successive ionic layer adsorption and reaction (SILAR) method at room temperature (∼300 K). The films are characterized for their structural and surface morphological properties. The formation of nanocrystalline SnO2 with porous and agglomerated particle morphology is revealed from X-ray diffraction (XRD) and scanning electron microscopy (SEM) studies, respectively. The Fourier transform infrared spectroscopy (FTIR) study confirmed the formation of Sn–O phase and hydrous nature of the deposited film. Static water contact angle studies showed the hydrophilic nature of SnO2:H2O thin film. Electrical resistivity showed the semiconducting behaviour with room temperature electrical resistivity of 105 𝛺 cm. The electrochemical properties studied in 0.5 M Na2SO4 electrolyte showed a specific capacitance of 25 F g-1 at 5 mVs-1 scan rate.
Volume 35 Issue 7 December 2012 pp 1181-1186
In the present investigation, TiO2, CdS and TiO2/CdS bilayer system have been deposited on the fluorine doped tin oxide (FTO) coated glass substrate by chemical methods. Nanograined TiO2 was deposited on FTO coated glass substrates by successive ionic layers adsorption and reaction (SILAR) method. Chemical bath deposition (CBD)method was employed to deposit CdS thin film on pre-deposited TiO2 film. A further study has beenmade for structural, surface morphological, optical and photoelectrochemical (PEC) properties of FTO/TiO2, FTO/CdS and FTO/TiO2/CdS bilayers system. PEC behaviour of FTO/TiO2/CdS bilayers was studied and compared with FTO/CdS single system. FTO/TiO2/CdS bilayers system showed improved performance of PEC properties over individual FTO/CdS thin films.
Volume 36 Issue 7 December 2013 pp 1171-1176
In the present investigation, we report the synthesis of ruthenium oxide (RuO2.𝑛H2O) thin films by simple chemical bath deposition (CBD) method at low temperature on the stainless steel substrate. The prepared thin films are characterized for their structural and morphological properties by means of X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FT–IR) and scanning electron microscopy (SEM). The structural study revealed that the ruthenium oxide thin films are amorphous. Scanning electron microscopy study shows compact morphology with small overgrown particles on the surface of the substrate. FT–IR study confirms the formation of RuO2.𝑛H2O material. The supercapacitor behaviour of RuO2.𝑛H2O thin film was studied using cyclic voltammetry (CV) technique in 0.5 M H2SO4 electrolyte. RuO2.𝑛H2O film showed maximum specific capacitance of 192 F.g-1 at a scan rate of 20 mV.s-1. The charge–discharge studies of RuO2.𝑛H2O carried out at 300 𝜇A.cm-2 current density revealed the specific power of 1.5 kW.kg-1 and specific energy of 41.6Wh.kg-1 with 95% coulombic efficiency.
Volume 42 | Issue 6
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