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Volume 46 All articles Published: 21 April 2023 Article ID 0084
Effect of annealing temperature on the properties of electrodeposited Cu$_2$O on FTO glass substrate
OUIDAD BAKA OUSSAMA BACHA MOHAMED REDHA KHELLADI AMOR AZIZI
This study aimed to investigate the formation of Cu$_2$O thin films on fluorine-doped tin oxide glass substrate by electrochemical deposition. The obtained Cu$_2$O thin films were annealed in air at various temperatures from 300 to 500°C. X-ray diffraction analysis shows that as-deposited and annealed thin films at 300°C have a cubic structure with a Cu$_2$O composition. The Cu$_2$O films annealed at 400 and 500°C were completely converted onto the monoclinic structure with CuO composition. On the other hand, atomic force microscope and scanning electron microscope images showed that the shape of Cu$_2$O grains was changed significantly from cubic to grains upon annealing. Mott–Schottky and photoelectrochemical measurements indicate that Cu$_2$O thin films exhibit p-type conductivity before and after annealing. Photoluminescence measurements indicated two peaks at around 523 and 355 nm, which confirmed the existence of Cu$_2$O and CuO thin films, respectively. Finally, the CuO nanostructures obtained at 500°C exhibited a high photocurrent enhancement and stability compared to as-deposited sample. As a consequence, the optical bandgap was reduced from 2.41 to 1.75 eV.
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Bulletin of Materials Science
Volume 46, 2023
All articles
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