M A VIDAL BORBOLLA
Articles written in Bulletin of Materials Science
Volume 40 Issue 6 October 2017 pp 1225-1230
This study presents an analysis of the photocatalytic efficiency in TiO$_2$:N thin films grown by atomic layer deposition related to the film thickness. The nitriding process was carried out with nitrogen plasma by molecular nitrogen decomposition after TiO$_2$ deposition. The study was performed using the time-dependent degradation of colour units for methylene-blue solutions and inactivation percentages for Escherichia coli bacteria, for potential applications in sewage purification. To determine the optoelectronic properties of the films, the optical, structural, surface and thickness characterizations were carried out by photoluminescence, Raman spectroscopy, atomic force microscopy and scanning electron microscopy, respectively.
Volume 43, 2020
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