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    • M Wadhwa

      Articles written in Bulletin of Materials Science

    • Volume 25 Issue 6 November 2002 pp 553-556

      Progress in deep-UV photoresists

      P B Sahoo R Vyas M Wadhwa S Verma

      More Details Abstract Fulltext PDF

      Higher resolution can be achieved in lithography by decreasing the wavelength of the exposure source. However, resist material and their processing are also important when we move to a shorter wavelength lithography technology. This paper reviews the recent development and challenges of deep-UV photoresists and their processing technology.

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    • Dr Shanti Swarup Bhatnagar for Science and Technology

      Posted on October 12, 2020

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      Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
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    • Editorial Note on Continuous Article Publication

      Posted on July 25, 2019

      Click here for Editorial Note on CAP Mode

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