Articles written in Bulletin of Materials Science
Volume 25 Issue 6 November 2002 pp 553-556
Higher resolution can be achieved in lithography by decreasing the wavelength of the exposure source. However, resist material and their processing are also important when we move to a shorter wavelength lithography technology. This paper reviews the recent development and challenges of deep-UV photoresists and their processing technology.
Volume 42 | Issue 6
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