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KRISHNA MANWANI
Articles written in Bulletin of Materials Science
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Volume 45 All articles Published: 26 October 2022 Article ID 0213
In this work, we report on the growth of high-quality transparent conducting niobium-doped anatase TiO$_2$ (NTO) thin film on soda-lime glass substrate (SLG) by altering the annealing temperature. To this end, NTO films (with athickness of ${\sim}$131 nm) are deposited on SLG substrates at room temperature by radio frequency (RF) magnetron sputtering, following which these films are subjected to the post-deposition annealing at temperatures (
T ) in the range of 623 to 1023 K for 1 h at ${\sim}$2.2 9 10$^{–4}$ Pa. The crystallinity of these NTO films is considerably altered withT , which is found to effect significantly their overall optoelectronic properties. NTO film fabricated at T of 823 K exhibited the lowest electrical resistivity of 9.84 ${\times}$ 10$^{–3}$ ${\Omega}$ cm (with carrier concentration of 0.74 ${\times}$ 10$^{21}$ cm$^{–3}$ and carrier mobility of 0.85 cm$^2$ V$^{–1}$ s$^{–1}$) and an average visible transmittance of ${\sim}$76%. Apart from developing an understanding on the role of annealing temperature on the microstructural, optical and electrical properties of NTO films, this study also realized the growth of high-quality NTO film on the cost-effective SLG substrate.
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Bulletin of Materials Science
Volume 46, 2023
All articles
Continuous Article Publishing mode
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Bulletin of Materials Science | News
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Dr Shanti Swarup Bhatnagar for Science and Technology
Posted on October 12, 2020Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
Chemical Sciences 2020Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
Physical Sciences 2020 -
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Posted on July 25, 2019Click here for Editorial Note on CAP Mode
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