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KATTA SAI KUMAR
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Volume 45 All articles Published: 27 September 2022 Article ID 0191
BANDLA BHARATH KUMAR KATTA SAI KUMAR VENKATA GIRISH KOTNUR
In this work, we report the effect of deposition pressure on the deposition of FeNbMoTaW thin films. Depositions were carried out at room temperature using DC-magnetron sputtering technique from a single target. The target was prepared in-house via high-energy mechanical milling and cold-pressing milled powders at room temperature. As-deposited films were amorphous. Films deposited at a pressure of 0.5 Pa showed a hardness of 13.05 ± 0.79 GPa. Air annealing studies reveal the transformation of amorphous FeNbMoTaW to crystalline oxide phases for temperatures exceeding 573 K. The delamination of films on annealing limits their application for temperatures greater than 573 K.
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Bulletin of Materials Science
Volume 46, 2023
All articles
Continuous Article Publishing mode
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Bulletin of Materials Science | News
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Dr Shanti Swarup Bhatnagar for Science and Technology
Posted on October 12, 2020Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
Chemical Sciences 2020Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
Physical Sciences 2020 -
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Posted on July 25, 2019Click here for Editorial Note on CAP Mode
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