Articles written in Bulletin of Materials Science
Volume 25 Issue 5 October 2002 pp 391-398 Thin Films
Equilibrium concentrations of various condensed and gaseous phases have been thermodynamically calculated, using the free energy minimization criterion, for the metalorganic chemical vapour deposition (MOCVD) of copper films using
Volume 28 Issue 1 February 2005 pp 49-54 Thin Films
Thin films of Sm2O3 have been grown on Si(100) and fused quartz by low-pressure chemical vapour deposition using an adducted 𝛽-diketonate precursor. The films on quartz are cubic, with no preferred orientation at lower growth temperatures (∼ 550°C), while they grow with a strong (111) orientation as the temperature is raised (to 625°C). On Si(100), highly oriented films of cubic Sm2O3 at 625°C, and a mixture of monoclinic and cubic polymorphs of Sm2O3 at higher temperatures, are formed. Films grown on either substrate are very smooth and fine-grained. Infrared spectroscopic study reveals that films grown above 600°C are free of carbon.
Volume 31 Issue 5 October 2008 pp 723-728 Thin Films
Thermodynamic calculations, using the criterion of minimization of total Gibbs free energy of the system, have been carried out for the metalorganic chemical vapour deposition (MOCVD) process involving the 𝛽-ketoesterate complex of iron [tris(𝑡-butyl-3-oxo-butanoato)iron(III) or Fe(tbob)3] and molecular oxygen. The calculations predict, under different CVD conditions such as temperature and pressure, the deposition of carbon-free pure Fe3O4, mixtures of different proportions of Fe3O4 and Fe2O3, and pure Fe2O3. The regimes of these thermodynamic CVD parameters required for the deposition of these pure and mixed phases have been depicted in a `CVD phase stability diagram’. In attempts at verification of the thermodynamic calculations, it has been found by XRD and SEM analysis that, under different conditions, MOCVD results in the deposition of films comprising pure and mixed phases of iron oxide, with no carbonaceous impurities. This is consistent with the calculations.
Volume 43, 2020
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