Temperature dependent analysis to achieve better performance by reducing threshold current requirements and field intensity has been carried out for GaN/AlGaN heterostructure lasers. The mirror loss in the GaN cavity has been obtained as a function of temperature and cavity length. The quantum efficiency has been deduced for different values of cavity length. Dependence of recombination rate on band gap and temperature has been investigated. Threshold current density has been deduced for GaN lasers and effect of temperature on it has been investigated. The near field intensity analysis has been carried out at different temperatures for 10% aluminum mole fraction in GaN/AlGaN heterostructure lasers. Furthermore, the effective index and FWHM of near field has been investigated as a function of temperature. It has been deduced from our analysis that temperature has a dominant effect on the threshold conditions and near field intensity in the wide band gap GaN based lasers.

Diamond-like carbon (DLC) films were deposited by microwave assisted chemical vapour deposition system using d.c. bias voltage ranging from –100 V to –300 V. These films were characterized by X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry techniques for estimating 𝑠𝑝³/𝑠𝑝² ratio. The 𝑠𝑝³/𝑠𝑝² ratio obtained by XPS is found to have an opposite trend to that obtained by spectroscopic ellipsometry. These results are explained using sub-plantation picture of DLC growth. Our results clearly indicate that the film is composed of two different layers, having entirely different properties in terms of void percentage and 𝑠𝑝³/𝑠𝑝² ratio. The upper layer is relatively thinner as compared to the bottom layer.

Diamond like carbon (DLC) films were deposited on Si (111) substrates by microwave electron cyclotron resonance (ECR) plasma chemical vapour deposition (CVD) process using plasma of argon and methane gases. During deposition, a d.c. self-bias was applied to the substrates by application of 13.56 MHz rf power. DLC films deposited at three different bias voltages (–60 V, –100 V and –150 V) were characterized by FTIR, Raman spectroscopy and spectroscopic ellipsometry to study the variation in the bonding and optical properties of the deposited coatings with process parameters. The mechanical properties such as hardness and elastic modulus were measured by load depth sensing indentation technique. The DLC film deposited at –100 V bias exhibit high hardness (∼ 19 GPa), high elastic modulus (∼ 160 GPa) and high refractive index (∼ 2.16–2.26) as compared to films deposited at –60 V and –150 V substrate bias. This study clearly shows the significance of substrate bias in controlling the optical and mechanical properties of DLC films.

Diamond like carbon (DLC) coatings were deposited on silicon substrates by microwave electron cyclotron resonance (ECR) plasma CVD process using plasma of Ar and CH4 gases under the influence of negative d.c. self bias generated on the substrates by application of RF (13.56 MHz) power. The negative bias voltage was varied from −60 V to −150 V during deposition of DLC films on Si substrate. Detailed X-ray reflectivity (XRR) study was carried out to find out film properties like surface roughness, thickness and density of the films as a function of variation of negative bias voltage. The study shows that the DLC films constituted of composite layer i.e. the upper sub surface layer followed by denser bottom layer representing the bulk of the film. The upper layer is relatively thinner as compared to the bottom layer. The XRR study was an attempt to substantiate the sub-plantation model for DLC film growth.