• Atsushi Hozumi

      Articles written in Bulletin of Materials Science

    • Application of MO calculation to plasma-enhanced CVD using organosilicon compounds

      Osamu Takai Atsushi Hozumi Yasushi Inoue Takashi Komori

      More Details Abstract Fulltext PDF

      Ultra water-repellent films for which contact angles of water drops exceed 150° were prepared by microwave plasma-enhanced CVD using two kinds of organosilicon compound and fluoro-alkyl silane (FAS) at low substrate temperature. Hexamethyldisilane (HMDS) and hexamethyldisiloxane (HMDSO) were used as starting materials. Molecular orbital (MO) calculation suggested that HMDS was more easily decomposable than HMDSO. The films prepared with HMDS and FAS had ultra water repellency. On the other hand, water repellency of the films prepared with HMDSO and FAS was similar to that of polytetrafluoroethylene.

  • Bulletin of Materials Science | News

    • Dr Shanti Swarup Bhatnagar for Science and Technology

      Posted on October 12, 2020

      Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
      Chemical Sciences 2020

      Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
      Physical Sciences 2020

    • Editorial Note on Continuous Article Publication

      Posted on July 25, 2019

      Click here for Editorial Note on CAP Mode

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