• Aixiang Wei

      Articles written in Bulletin of Materials Science

    • Structural and electrical properties of Ta2O5 thin films prepared by photo-induced CVD

      Jun Liu Aixiang Wei Xianghui Zhao Haiyan Zhang

      More Details Abstract Fulltext PDF

      Tantalum oxide (Ta2O5) films and Al/Ta2O5/Si MOS capacitors were prepared at various powers by ultraviolet photo-inducing hot filament chemical vapour deposition (HFCVD). Effects of ultraviolet light powers on the structure and electrical properties of Ta2O5 thin films were studied using X-ray diffraction (XRD) and atomic forcemicroscopy (AFM). The dielectric constant, leakage current density and breakdown electric field of the samples were studied by the capacitance–voltage (C–V) and current–voltage (𝐼–𝑉) measurements of the Al/Ta2O5/Si MOS capacitors. Results show that the Ta2O5 thin films grown without inducement of UV light belong to amorphous phase, whereas the samples grown with inducement of UV-light belong to 𝛿-Ta2O5 phase. The dielectric constant and leakage current density of the Ta2O5 thin films increase with increasing powers of the UV- lamps. Effects of UVlamp powers on the structural and electrical properties were discussed.

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    • Dr Shanti Swarup Bhatnagar for Science and Technology

      Posted on October 12, 2020

      Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
      Chemical Sciences 2020

      Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
      Physical Sciences 2020

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      Posted on July 25, 2019

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