A K Nath
Articles written in Bulletin of Materials Science
Volume 11 Issue 2-3 November 1988 pp 159-166
Controlled, anisotropic etching of different materials commonly used in microelectronics is an important processing step in microfabrications. During recent years it has been demonstrated that lasers can be used for initiating and enhancing the etching process in many gas-solid (dry processing) and liquid-solid (wet processing) systems. The laser-induced reaction could be either photochemical or thermochemical. Using laser etching technique a variety of materials such as Al, Ta, Ni/Fe, GaAs, InP, Si, SiO2 mylar, different polymers and superconducting materials have been processed. In this paper we briefly review these laser etching experiments.
Volume 11 Issue 2-3 November 1988 pp 245-259
The important gas lasers which find wide applications in material processing are the CO2 laser, the argon-ion laser and the excimer lasers. This paper briefly describes the basic concepts and the technology of these lasers.
Volume 44, 2021
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Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
Chemical Sciences 2020
Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
Physical Sciences 2020
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