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      https://www.ias.ac.in/article/fulltext/sadh/047/0065

    • Keywords

       

      Coplanar waveguide; microstrip transmission line; RF MEMS switch; via less CPW-MS transitions; silicon bulk micromaching.

    • Abstract

       

      This paper presents the design, fabrication and packaging of RF MEMS switches that have CPWconverted- to-microstrip RF interface at the die level. With microstrip input and output ports the packaging of the dies become greatly simplified, doing away with the need for having off-chip matching and RF transition components inside the package. Two designs are presented, each based on a different philosophy for conversion of the inherent CPW version of the chip to microstrip planar transmission line; i) conversion to microstripthrough RF matching, ii) CPW to microstrip on-chip via less transition. Detailed 3D EM simulation based studies were carried out to arrive at the final RF layouts. The switches were fabricated using the silicon on glass architecture and packaged in hermetic RF packages at 1 atm N2. Wafer level and post packaging test methods are described. Over the range DC to 10 GHz, the worst case packaged device insertion loss, return loss and isolation are -1.2 dB, -13 dB, -37.5 dB for the first design variant of the switch and are -1.2 dB, -11 dBand -30 dB respectively for the second design variant. The typical pull in voltage is 50 V.

    • Author Affiliations

       

      SHAILENDRA SINGH1 M S GIRIDHAR2 ASHWINI JAMBHALIKAR2 T K PRATHEEK2 AKSHAYA2 SUPRIYA GOGULAPATI2 DEEPAK KUMAR SHARMA2 JIJU JOHN2 JOLLY DHAR1 C V N RAO1 RAJEEV JYOTI1 SANGAM BHALKE3

      1. Space Applications Center (ISRO), Jodhpur Tekra, Ambawadi Vistar, Ahmedabad 380015, India
      2. Laboratory for Electro Optic Systems (ISRO), 1st Cross, 1st Stage, Peenya Industrial Area, Bangalore 560058, India
      3. Gallium Arsenide Enabling Technology Center, Vignyana Kancha Post, Hyderabad 560069, India
    • Dates

       
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