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      https://www.ias.ac.in/article/fulltext/sadh/034/04/0557-0562

    • Keywords

       

      RF sputtering; sputtered PSG film; microstructures; surface micromachining.

    • Abstract

       

      In this paper, we explore RF magnetron sputtered Phosphor–silicate–glass (PSG) film as a sacrificial layer in surface micromachining technology. For this purpose, a 76 mm diameter target of phosphorus-doped silicon dioxide was prepared by conventional solid-state reaction route using P2𝑂5 and SiO2 powders. The PSG films were prepared in a RF (13·56 MHz) magnetron sputtering system at 300 watt RF power, 20 mTorr pressure and 45 mm target-to-substrate spacing without external substrate heating. Microstructures of sputtered silicon dioxide film were fabricated using sputtered PSG film as sacrificial layer in surface micromachining process.

    • Author Affiliations

       

      Vivekanand Bhatt1 Sudhir Chandra1 Chatar Singh2

      1. Centre for Applied Research in Electronics (CARE), Indian Institute of Technology Delhi, New Delhi 110 016
      2. Textile Technology, Indian Institute of Technology Delhi, New Delhi 110 016
    • Dates

       
  • Sadhana | News

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