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      Permanent link:
      https://www.ias.ac.in/article/fulltext/reso/023/04/0423-0438

    • Keywords

       

      Soft lithography, antireflection, nanopattern, moth eye, elastomer stamp, PDMS stamp, resolution, photolithography, nanostructure.

    • Abstract

       

      Antireflection is an essential requirement for certain optoelectronicdevices. Antireflective surfaces can be generatedby different methods. One method mimics the nanofeatureson the moth eye surface. This can be done by ‘soft lithography’(SL), where nanofeatures are created on an elastomericstamp. This stamp is then used for imprinting the pattern onother surfaces.

    • Author Affiliations

       

      Geethamma V G1 Kazuki Shigeta2 John A Rogers3

      1. Department of Polymer Engineering, University College of Engineering, Thodupuzha, Kerala 658 587, India.
      2. Electronic and Imaging Materials Research Labs, Toray Industries, Inc., 1-2, Sonoyama 3-chrome, Otsu, Shiga 520-0842, Japan
      3. The frederick Seitz Materials Research Laboratory, 104, S Goodwin Ave. Room 2016, Urbana, IL 61801, USA
    • Dates

       

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