• Photoresists for Microlithography - The Role of Polymer Microstructure

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      Permanent link:
      https://www.ias.ac.in/article/fulltext/reso/007/08/0059-0066

    • Keywords

       

      High ortho novolak resins; NMR and lithographic performance; device fabrication.

    • Author Affiliations

       

      Debmalya Roy1 P K Basu1 S V Eswaran2

      1. Solid State Physics Laboratory, Lucknow Road Delhi 110054, India.
      2. Principal, Deshbandhu College, University of Delhi Kalkaji New Delhi 110019, India.
    • Dates

       
  • Resonance – Journal of Science Education | News

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