Indian Academy of Sciences
Photoresists for Microlithography - The Role of Polymer Microstructure
Debmalya Roy P K Basu S V Eswaran
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High ortho novolak resins; NMR and lithographic performance; device fabrication.
Debmalya Roy1 P K Basu1 S V Eswaran2
Current Issue Volume 27 | Issue 6June 2022
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