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    • Photoresists for Microlithography - Role of Organic Chemistry in Microelectronics

      Debmalya Roy P K Basu S V Eswaran

      General Article Volume 7 Issue 7 July 2002 pp 44-53

    • Fulltext

       

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      Permanent link:
      https://www.ias.ac.in/article/fulltext/reso/007/07/0044-0053

    • Keywords

       

      Photoactive compounds; novo-10k resins; CA resists; sub-micron lithography.

    • Author Affiliations

       

      Debmalya Roy1 P K Basu1 S V Eswaran2

      1. Solid State Physics laboratory, lucknow Road Delhi 110054, India.
      2. Principal, Deshbandhu College, University of Delhi Kalkaji New Delhi 110019, India.

    • Dates

       
      Published
      July 2002

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