Targets of $^{20}$Ne and $^{22}$Ne nuclides were produced for nuclear astrophysics experiments by implanting them into tantalum backing material at the Ion Beam Centre (IBC), Helmholtz Zentrum Dresden Rossendorf (HZDR), Dresden. Each Ne nuclide was implanted alternatively at 30 keV and 50 keV. As significant sputteringof both neon and tantalum atoms occurs during implantation, the final neon depth profiles and areal densities of all four target types were analysed. Nuclear resonance analysis (NRA), Rutherford backscattering (RBS), elasticrecoil detection analysis (ERDA) and proton-induced X-ray emission (PIXE) methods were used for detailed neon target analyses using the 6 MV Tandetron facility at the Advanced Technologies Research Institute of the Facultyof Materials Science and Technology in Trnava. Nuclear reactions $^{22}$Ne(p, γ )$^{23}$Na at resonance energy (Eres) = 639 keV and $^{20}$Ne(p, γ )$^{21}$Na at Eres = 1169 keV were used for neon concentration depth profiling. The measured depth profiles were compared with the predictions given by the SRIM and the dynamic TRIDYN implantation simulations, which also consider the sputtering process. Impurity contamination and substrate roughness were checked by PIXE and ERDA measurements, respectively. The NRA technique was suitable for monitoring the target stability after one year of implantation.