In the current study, the gate overlap on the drain side was investigated from the prospects of both DC and high-frequency behaviour. The key parameters extracted in this work to determine the main performance parameters are subthreshold swing (SS), ambipolar current (I$_{amb}$), ON/OFF current ratio and cut-off frequency. Although the gate overlap on the drain decreases the ambipolar current, it has an adverse effect on the high-frequency performance as the gate-to-drain capacitance increases. This behaviour is observed for increasing overlap length for low-k gate oxide. On the other hand, the ambipolar current does not show a considerable decline when using high-k gate oxide. To obtain a low ambipolar current at lower values of equivalent oxide thickness (EOT), we propose a low-k dielectric spacer above the drain side. The low-k spacer not only decreases the gate-to-drain capacitance butalso facilitates the suppression of ambipolarity due to overlap. All simulations carried out in this work are done using the Silvaco TCAD device simulator.