1. Home
    2. Journals
    3. Journal of Chemical Sciences
    4. Volume 115
    5. Issue 5-6

    • Ultra thin films of nanocrystalline Ge studied by AFM and interference enhanced Raman scattering

      S Balaji S Mohan D V S Muthu A K Sood

      Volume 115 Issue 5-6 October 2003 pp 401-410

    • Fulltext

       

        Click here to view fulltext PDF


      Permanent link:
      https://www.ias.ac.in/article/fulltext/jcsc/115/05-06/0401-0410

    • Keywords

       

      Ion beam sputtering; ultra thin Ge films; interference enhanced Raman spectroscopy; phonon confinement; atomic force microscopy

    • Abstract

       

      Initial growth stages of the ultra thin films of germanium (Ge) prepared by ion beam sputter deposition have been studied using atomic force microscope (AFM) and interference enhanced Raman scattering. The growth of the films follows Volmer-Weber growth mechanism. Analysis of the AFM images shows that Ostwald ripening of the grains occurs as the thickness of the film increases. Raman spectra of the Ge films reveal phonon confinement along the growth direction and show that the misfit strain is relieved for film thickness greater than 4 nm.

    • Author Affiliations

       

      S Balaji1 S Mohan1 D V S Muthu2 A K Sood2

      1. Department of Instrumentation, Indian Institute of Science, Bangalore - 560 012, India
      2. Department of Physics, Indian Institute of Science, Bangalore - 560 012, India

    • Dates

       
      Published
      12 October 2003

  • Journal of Chemical Sciences | News

© 2022-2023 Indian Academy of Sciences, Bengaluru.

Contact | Site index