Preparation and characterization of hafnium-zirconium oxide ceramics as a CMOS compatible material for non-volatile memories
URVASHI SHARMA CHARANJEET SINGH VISHNU M VARMA GULSHAN KUMAR SACHIN MISHRA ASHOK KUMAR REJI THOMAS
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Hf$_x$Zr$_{1-x}$O$_2$ (HZO) ceramics with x = 0.25, 0.50 and 0.75 were prepared by conventional solid-state reaction technique. Structural studies of the synthesized stoichiometric compounds were done by X-ray diffraction. The microstructure/morphology and composition of ceramics were obtained with field emission-scanning electron microscopy and energy dispersive X-ray, respectively. Impedance spectroscopic studies were done to study the temperature-dependentand frequency-dependent dielectric properties. The dielectric constants at 10 kHz of Hf$_x$Zr$_{1-x}$O$_2$ ceramics were increased from 17 to 40 with Hf varying from 0.25 to 0.75 at ambient conditions. Ferroelectric studies were also done on these compositions with the help of a polarization-electric field plot and are discussed.
URVASHI SHARMA1 CHARANJEET SINGH2 3 VISHNU M VARMA4 GULSHAN KUMAR5 6 SACHIN MISHRA1 ASHOK KUMAR2 REJI THOMAS4 5
Volume 46, 2023
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Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
Chemical Sciences 2020
Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
Physical Sciences 2020
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