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    • Keywords


      High-entropy alloys; powder targets; magnetron sputtering; thin films.

    • Abstract


      In this work, we report the effect of deposition pressure on the deposition of FeNbMoTaW thin films. Depositions were carried out at room temperature using DC-magnetron sputtering technique from a single target. The target was prepared in-house via high-energy mechanical milling and cold-pressing milled powders at room temperature. As-deposited films were amorphous. Films deposited at a pressure of 0.5 Pa showed a hardness of 13.05 ± 0.79 GPa. Air annealing studies reveal the transformation of amorphous FeNbMoTaW to crystalline oxide phases for temperatures exceeding 573 K. The delamination of films on annealing limits their application for temperatures greater than 573 K.

    • Author Affiliations



      1. School of Engineering Sciences and Technology (SEST), University of Hyderabad, Hyderabad 500 046, India
    • Dates

  • Bulletin of Materials Science | News

    • Dr Shanti Swarup Bhatnagar for Science and Technology

      Posted on October 12, 2020

      Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
      Chemical Sciences 2020

      Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
      Physical Sciences 2020

    • Editorial Note on Continuous Article Publication

      Posted on July 25, 2019

      Click here for Editorial Note on CAP Mode

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