• A negative tone lift-off method for small metal holes using PMMA/SiO$_2$ double layer

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    • Keywords


      E-beam lithography; lift-off; metal-hole.

    • Abstract


      We propose a novel method to fabricate small apertures in a metal film using polymethyl methacrylate (PMMA). A PMMA/SiO$_2$ double layer is employed to perform a negative tone lift-off with SiO$_2$ as a sacrificial layer. Through this method, we succeeded in making sub-50 nm holes in a metal film using well-established individual fabrication steps. The proposed method will be more reliable and economical compared to the hydrogen silsesquioxane/ PMMA bilayer method.

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    • Author Affiliations


      J S BAEK D LEE1

      1. Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea
    • Dates

  • Bulletin of Materials Science | News

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