We propose a novel method to fabricate small apertures in a metal film using polymethyl methacrylate (PMMA). A PMMA/SiO$_2$ double layer is employed to perform a negative tone lift-off with SiO$_2$ as a sacrificial layer. Through this method, we succeeded in making sub-50 nm holes in a metal film using well-established individual fabrication steps. The proposed method will be more reliable and economical compared to the hydrogen silsesquioxane/ PMMA bilayer method.
Volume 45, 2022
Continuous Article Publishing mode
Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
Chemical Sciences 2020
Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
Physical Sciences 2020
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