This study reports the fabrication of carbon using ions of carbon generated by high temperature, high density and extremely non-equilibrium argon plasma produced in modified dense plasma focus device. Carbon is deposited using two bursts of focussed plasma on n-type silicon substrates kept at a temperature of 20 (room temperature) and 130°C. The formation of nano-diamond-like carbon (nano-DLC) is observed at substrate temperature of 130°C. The samplesdeposited at different substrate temperatures are found to have amorphous in nature as observed from X-ray diffraction studies. These amorphous samples of carbon and nano-DLC possess nanostructures of average size ${\sim}$27 and ${\sim}$10 nm for 20 and 130°C substrate temperature, respectively, as obtained from atomic force microscopy and scanning electron microscopy studies. The possibility of formation of nano-DLC was analysed using Raman measurements. Peaks related toD and G band of graphitic carbon are observed in Raman spectra of both the samples. However, the samples grown at substrate temperature of 130°C show peaks related to nano-grain of diamond in Raman spectra, indicating high sp$^3$ content, thereby confirming the formation of nano-DLC. The hardness measurement reveals the maximum value of hardness ${\sim}$45.5 GPa for nano-DLC sample, which reconfirms that sample is of nano-DLC nature. The nano-DLC arefound to have band gap of ${\sim}$2.45 eV, which makes the nano-DLC a potential candidate for applications in protective optical window coating.