• Solvo-selective imprinting of a thin polymer blend film for creating multi-length scale patterns

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    • Keywords


      Polymer blends; phase separation; capillary force lithography; patterning; solvent vapour.

    • Abstract


      Controlling and spatial ordering of the phase separation in ultra-thin polymer-blend films is a viable approach to create complex surface structures with unique properties. This study reports a facile solvo-selective patterning techniquein a phase-separated polymer blend thin film comprising of immiscible polymers polystyrene (PS) and poly(methylmethacrylate) (PMMA). The pattern replication was achieved using capillary force lithography by imprinting the blendfilms with cross-linked polydimethylsiloxane stamp with grating patterns. The replication was done in the presence of 1-chloropentane or acetic acid vapours, which are selective solvents for PS and PMMA, respectively. This engenderedcapillary flow of only one phase while the domains of the second phase remain rigid. Depending on the initial as-cast morphology of the film which is a function of the relative proportion of PS and PMMA, a variety of structures wereobtained by combining the phase-separated domains with the structure imposed by the stamp. This method can be considered as a simple, one-step technique for creating hierarchical patterns that are likely to find applications inmodulating properties of soft surfaces.

    • Author Affiliations



      1. Department of Chemical Engineering, Birla Institute of Technology and Science Pilani, Hyderabad 500078, India
    • Dates

  • Bulletin of Materials Science | News

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