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      https://www.ias.ac.in/article/fulltext/boms/043/0123

    • Keywords

       

      SiC; thin films; resistive switching; nanocrystalline graphite.

    • Abstract

       

      Amorphous silicon carbide (a-SiC) films of thickness 50–300 nm are deposited by a single composite target magnetron sputtering process. Metal–SiC–metal structures are fabricated to demonstrate resistive switching. The top metal electrode is Cu, Pt or Ag and the bottom electrode is fixed as Au. Reversible resistive switching from high to low resistance states is observed for SiC films at voltages between 1 and 5 V. The interface between metal electrode and a-SiC films plays a significant role in achieving optimal switching performance. Resistance OFF/ON ratios of 10$^8$, retention times >10$^4$ s and endurance of 50 cycles are achieved in the best devices. Cross-sectional scanning electron microscopy, Raman spectroscopy and X-ray photoelectron spectroscopy are employed to understand the mechanism of device operation. Raman spectroscopy indicates the formation of nanocrystalline graphite in these devices after a few cycles of operation.

    • Author Affiliations

       

      POREDDY CHAITANYA AKSHARA1 NILANJAN BASU2 JAYEETA LAHIRI2 GURUSWAMY RAJARAM1 2 M GHANASHYAM KRISHNA1 2

      1. Centre for Advanced Studies in Electronics Science and Technology, University of Hyderabad, Hyderabad 500046, India
      2. School of Physics, University of Hyderabad, Hyderabad 500046, India
    • Dates

       
  • Bulletin of Materials Science | News

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    • Editorial Note on Continuous Article Publication

      Posted on July 25, 2019

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