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      https://www.ias.ac.in/article/fulltext/boms/042/05/0251

    • Keywords

       

      SiCN; Raman; XRD; FTIR; nanoindentation.

    • Abstract

       

      Silicon carbonitride (SiCN) thin films were deposited on p-Si (100) substrates with different N₂ flow rates using SiC and Si₃N₄ powder precursors by chemical vapour deposition. To investigate the structural, vibrational and mechanical properties, the SiCN thin films were characterized by atomic force microscopy, Raman spectroscopy, X-ray diffraction (XRD), Fourier transform infrared and nanoindentation techniques. The XRD results reveal nanocrystals embedded with amorphous networks in the SiCN thin films. An increase in the $I$_{D}/$I$_{G} ratio with an increase in the N₂ flow rate indicated the increase of sp³ bonds in the SiCN thin film. The hardness ($H$), Young’s modulus ($E$), plasticity index ($H/E$) and ($H$³/$E$²) increase with an increase in the N₂ flow rate.

    • Author Affiliations

       

      DHRUVA KUMAR1 RANJAN Kr GHADAI1 SOHAM DAS1 ASHIS SHARMA1 BIBHU P SWAIN2

      1. Department of Mechanical Engineering, Sikkim Manipal Institute of Technology, Sikkim Manipal University, Gangtok 737136, India
      2. Department of Physics, National Institute of Technology Manipur, Langol 795004, India
    • Dates

       
  • Bulletin of Materials Science | News

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