This article demonstrates the possibility of controlling the morphology of deposited metal oxide ﬁlms by the preliminary formation of the seed-layers of the appropriate oxide on the substrate surface using a simple and cheap method such as successive ionic layer deposition. The study focuses on SnO₂ and In₂O₃ due to their importance in the ﬁeld of various chemical microsensors.
Volume 43, 2020
Continuous Article Publishing mode
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