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      Permanent link:
      https://www.ias.ac.in/article/fulltext/boms/040/06/1225-1230

    • Keywords

       

      Photocatalytic; atomic layer deposition; anatase phase; photoluminescence; degradation; inactivation.

    • Abstract

       

      This study presents an analysis of the photocatalytic efficiency in TiO$_2$:N thin films grown by atomic layer deposition related to the film thickness. The nitriding process was carried out with nitrogen plasma by molecular nitrogen decomposition after TiO$_2$ deposition. The study was performed using the time-dependent degradation of colour units for methylene-blue solutions and inactivation percentages for Escherichia coli bacteria, for potential applications in sewage purification. To determine the optoelectronic properties of the films, the optical, structural, surface and thickness characterizations were carried out by photoluminescence, Raman spectroscopy, atomic force microscopy and scanning electron microscopy, respectively.

    • Author Affiliations

       

      M M M CONTRERAS TURRUBIARTES1 E LÓPEZ LUNA1 J L ENRIQUEZ-CARREJO2 A PEDROZA RODRIGUEZ3 J C SALCEDO REYES3 M A VIDAL BORBOLLA1 P G MANI-GONZALEZ2

      1. Coordinacion para la Innovación y Aplicación de la Ciencia y la Tecnología, Universidad Autónoma de San Luis Potosí, Sierra Leona #550, Lomas 2a. Sección, San Luis Potosí, Mexico
      2. Departamento de Física y Matemáticas, Instituto de Ingeniería y Tecnología, Universidad Autónoma de Ciudad Juárez, Ave. Del Charro 450, Cd., C.P. 32310 Juárez, Chihuahua, Mexico
      3. Pontificia Universidad Javeriana, Carrera 7 #40-62, Bogotá, Colombia
    • Dates

       
  • Bulletin of Materials Science | News

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