Investigation of capacitance characteristics in metal/high-$k$ semiconductor devices at different parameters and with and without interface state density (traps)
Click here to view fulltext PDF
Permanent link:
https://www.ias.ac.in/article/fulltext/boms/040/05/1035-1041
Capacitance vs. voltage ($C−V$) curves at AC high frequency of a metal–insulator–semiconductor (MIS) capacitorare investigated in this paper. Bi-dimensional simulations with Silvaco TCAD were carried out to study the effect ofoxide thickness, the surface of the structure, frequency, temperature and fixed charge in the oxide on the $C−V$ curves. We evaluate also the analysis of MIS capacitor structures by different substrate doping concentrations with and without interfacestate density at different temperatures (100, 300 and 600 K). These studies indicate that the doping substrate concentrationand the traps enormously affect the high-frequency $C−V$ curve behaviour. We also demonstrate that for low and hightemperatures, the high-frequency $C−V$ curves behaviour changes, indicating that the capacitance due to the substrate issignificantly influenced in these conditions (bias and substrate doping concentration).
S HLALI1 N HIZEM1 A KALBOUSSI1
Volume 46, 2023
All articles
Continuous Article Publishing mode
Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
Chemical Sciences 2020
Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
Physical Sciences 2020
Click here for Editorial Note on CAP Mode
© 2022-2023 Indian Academy of Sciences, Bengaluru.