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      Permanent link:
      https://www.ias.ac.in/article/fulltext/boms/036/07/1133-1138

    • Keywords

       

      Thin films; DLC/SiO2/Al2O3 membrane; nanofiltration.

    • Abstract

       

      High quality ceramic thin films were fabricated by thin film deposition process in semiconductor field in order to fabricate high performance carbon/SiO2/Al2O3 membrane. 𝛼-Al2O3 substrate was used as a supporting material. A severe thermal stress and rough surface for active ceramic top layer such as zeolite were observed. To overcome thermal stress, intermediate layer of SiO2 and diamond-like carbon (DLC) thin films were used. SiO2 and DLC thin films on porous alumina support were deposited using plasma-enhanced chemical vapour deposition (PECVD). Homogeneous and smooth surfaces and interfaces of DLC/SiO2/Al2O3 membrane were observed by FESEM. The phases of DLC and SiO2 thin films were identified by X-ray diffraction pattern. Gas permeabilities of the nanofiltration membrane with DLC/SiO2/Al2O3 were observed at various annealing temperatures. Mixed gas permeability of the membrane with 1 𝜇m-thick SiO2 and 2 𝜇m-thick DLC thin filmannealed at 200 °C was ∼18 ccm at 1018 mb back pressure.

    • Author Affiliations

       

      Jin-Su Jeong1 Churl-Hee Cho2 Jong-Oh Kim3 Dong-Hun Yeo4 Won-Youl Choi1

      1. Department of Metal and Materials Engineering, Gangneung-Wonju National University, Gangneung 210 702, Korea
      2. Graduate School of Green Energy Technology, Chungnam National University, Daejeon 305 764, Korea
      3. Department of Civil Engineering, Gangneung-Wonju National University, Gangneung 210 702, Korea
      4. Advanced Materials Convergence Division, Korea Institute of Ceramic Engineering and Technology, Seoul 153 801, Korea
    • Dates

       
  • Bulletin of Materials Science | News

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