• Influence of nitrogen flow rates on materials properties of CrN𝑥 films grown by reactive magnetron sputtering

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    • Keywords


      Thin films; magnetron sputtering; chromium nitride; X-ray diffraction.

    • Abstract


      Chromium nitride (CrN) hard thin films were deposited on different substrates by reactive direct current (d.c.) magnetron sputtering with different nitrogen flow rates. The X-ray diffraction patterns showed mixed Cr2N and CrN phases. The variations in structural parameters are discussed. The grain size increased with increasing nitrogen flow rates. Scanning electron microscopy image showed columnar and dense microstructure with varying nitrogen flow rates. An elemental analysis of the samples was realized by means of energy dispersive spectroscopy. The electrical studies indicated the semiconducting behaviour of the films at the nitrogen flow rate of 15 sccm.

    • Author Affiliations


      B Subramanian1 K Prabakaran1 M Jayachandran1

      1. Electrochemical Materials Science Division, CSIR- Central Electrochemical Research Institute, Karaikudi 630 006, India
    • Dates

  • Bulletin of Materials Science | News

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      Posted on July 25, 2019

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