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    • Fulltext

       

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      Permanent link:
      https://www.ias.ac.in/article/fulltext/boms/034/07/1633-1637

    • Keywords

       

      Low-pressure thermogravimetry; vapour pressure; Langmuir equation; partial pressure; precursor; metalorganic chemical vapour deposition.

    • Abstract

       

      A method for the estimation of vapour pressure and partial pressure of subliming compounds under reduced pressure, using rising temperature thermogravimetry, is described in this paper. The method is based on our recently developed procedure to estimate the vapour pressure from ambient pressure thermogravimetric data using Langmuir equation. Using benzoic acid as the calibration standard, vapour pressure–temperature curves are calculated at 80, 160 and 1000 mbar for salicylic acid and vanadyl bis-2,4-pentanedionate, a precursor used for chemical vapour deposition of vanadium oxides. Using a modification of the Langmuir equation, the partial pressure of these materials at different total pressures is also determined as a function of temperature. Such data can be useful for the deposition of multi-metal oxide thin films or doped thin films by chemical vapour deposition (CVD).

    • Author Affiliations

       

      G V Kunte1 Ujwala Ail2 P K Ajikumar2 A K Tyagi2 S A Shivashankar1 A M Umarji1

      1. Materials Research Centre, Indian Institute of Science, Bangalore 560 012, India
      2. Materials Science Division, Indira Gandhi Centre for Atomic Research, Kalpakkam 603 102, India

    • Dates

       
      Published
      December 2011
      Manuscript received
      1 August 2009

  • Bulletin of Materials Science | News

    • Dr Shanti Swarup Bhatnagar for Science and Technology

      Posted on October 12, 2020

      Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
      Chemical Sciences 2020

      Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
      Physical Sciences 2020

    • Editorial Note on Continuous Article Publication

      Posted on July 25, 2019

      Click here for Editorial Note on CAP Mode

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