This work describes the laser annealing of 𝑎-SiC and 𝑎-SiC𝑥N𝑦 films deposited on (100) Si and quartz substrates by RF magnetron sputtering. Two samples of 𝑎-SiC𝑥N𝑦 thin films were produced under different N2/Ar flow ratios. Rutherford backscattering spectroscopy (RBS), Raman analysis and Fourier transform infrared spectrometry (FTIR) techniques were used to investigate the composition and bonding structure of as-deposited and laser annealed SiC and SiC𝑥N𝑦 films.
Volume 46, 2023
Continuous Article Publishing mode
Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
Chemical Sciences 2020
Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
Physical Sciences 2020
Click here for Editorial Note on CAP Mode