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      https://www.ias.ac.in/article/fulltext/boms/034/03/0483-0489

    • Keywords

       

      Coatings; sputtering; titanium; interfaces; X-ray diffraction; electron microscopy.

    • Abstract

       

      The growth characteristics of titanium films deposited on glass, silicon (100) and oxygen free high purity copper substrate using magnetron sputtering have been investigated using X-ray diffraction, electron microscopy and scratch indentation techniques. The study of interface between the titanium film and the substrate was carried out to determine coating thickness, as well as intermixing of the elements at the interface. Studies revealed that the interface is free from voids and intermixing of the film and the substrate. Microstructural and diffraction analysis showed that the Ti coating was polycrystalline and exhibited columnar growth. The Ti crystallite size varied between 24 and 58 nmdepending on the substrate. The thickness of the films were typically about 4 𝜇m. Scratch test indicated that the films are adherent and the first critical load to failure was observed to be 4.5 N ± 2 N.

    • Author Affiliations

       

      Arup Dasgupta1 Akash Singh1 Pradyumna Kumar Parida1 R Ramaseshan2 P Kuppusami1 S Saroja1 M Vijayalakshmi1

      1. Physical Metallurgy Division, Indira Gandhi Centre for Atomic Research, Kalpakkam 603 102, India
      2. Surface and Nanoscience Division, Indira Gandhi Centre for Atomic Research, Kalpakkam 603 102, India
    • Dates

       
  • Bulletin of Materials Science | News

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