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    • Preparation and characterization of nanostructured copper bismuth diselenide thin films from a chemical route

      R H Bari L A Patil

      Volume 33 Issue 6 December 2010 pp 663-670

    • Fulltext

       

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      Permanent link:
      https://www.ias.ac.in/article/fulltext/boms/033/06/0663-0670

    • Keywords

       

      Copper bismuth diselenide; thin films; chemical bath deposition; deposition parameters.

    • Abstract

       

      Thin films of copper bismuth diselenide were prepared by chemical bath deposition technique onto glass substrate below 60°C. The deposition parameters such as time, temperature of deposition and pH of the solution, were optimized. The set of films having different elemental compositions was prepared by varying Cu/Bi ratio from 0.13–1.74. Studies on structure, composition, morphology, optical absorption and electrical conductivity of the films were carried out and discussed. Characterization includes X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), energy dispersive X-ray analysis (EDAX), absorption spectroscopy, and electrical conductivity. The results are discussed and interpreted.

    • Author Affiliations

       

      R H Bari1 L A Patil1

      1. P.G. Department of Physics, Pratap College, Amalner 425 401, India

    • Dates

       
      Published
      December 2010
      Manuscript received
      1 July 2009
      Manuscript revised
      9 September 2009

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