Effect of substrate roughness on growth of diamond by hot filament CVD
Awadesh K Mallik S R Binu L N Satapathy Chandrabhas Narayana Md Motin Seikh S A Shivashankar S K Biswas
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Polycrystalline diamond coatings are grown on Si (100) substrate by hot filament CVD technique. We investigate here the effect of substrate roughening on the substrate temperature and methane concentration required to maintain high quality, high growth rate and faceted morphology of the diamond coatings. It has been shown that as we increase the substrate roughness from 0.05 𝜇m to 0.91 𝜇m (centre line average or CLA) there is enhancement in deposited film quality (Raman peak intensity ratio of 𝑠𝑝3 to non-𝑠𝑝3 content increases from 1.65 to 7.13) and the substrate temperature can be brought down to 640°C without any additional substrate heating. The coatings grown at adverse conditions for 𝑠𝑝3 deposition has cauliflower morphology with nanocrystalline grains and coatings grown under favourable 𝑠𝑝3 condition gives clear faceted grains.
Awadesh K Mallik1 2 S R Binu1 3 L N Satapathy1 4 Chandrabhas Narayana1 5 Md Motin Seikh1 6 S A Shivashankar1 2 S K Biswas1 2 3
Volume 46, 2023
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Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
Chemical Sciences 2020
Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
Physical Sciences 2020
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