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    • Critical shear stress produced by interaction of edge dislocation with nanoscale inhomogeneity

      Q H Fang J M Chen Y W Liu P H Wen

      Thin Films and Nanomatter Volume 33 Issue 2 April 2010 pp 123-127

    • Fulltext

       

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      Permanent link:
      https://www.ias.ac.in/article/fulltext/boms/033/02/0123-0127

    • Keywords

       

      Edge dislocation; nanoscale inhomogeneity; interface stress.

    • Abstract

       

      According to the Mott and Nabarro’s model, the contribution to the critical shear stress of the material caused by the interaction between edge dislocations and nanoscale cylindrical inhomogeneities with interface stresses is obtained. The influence of the radius and the volume fraction of the inhomogeneity as well as the interface stresses on the critical shear stress is investigated. The important result is that, if the interface stress is considered, a maximum of the contribution to the critical shear stress produced by this interaction may be obtained when the radius of the inhomogeneity reaches a critical value.

    • Author Affiliations

       

      Q H Fang1 J M Chen1 Y W Liu1 P H Wen2

      1. Department of Mechanical Engineering, Hunan International Economics University, Changsha 410205, P.R. China
      2. Department of Engineering, Queen Mary, University of London, London EI 4NS, UK

    • Dates

       
      Published
      April 2010
      Manuscript received
      30 December 2008
      Manuscript revised
      26 April 2009

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